More than fifty Filmetrics F20s have been delivered for use in university teaching labs. +1 858-573-9300 Measure thickness, cystalinity, and n and k of all forms of amorphous and polycrystalline silicon. No guarantee of accuracy - use at your own risk. SiO2 – Silicon dioxide is one of the simplest materials to measure, primarily because it is non-absorbing (k=0) over most wavelengths and is usually very close to being stoichiometric (i.e. nanomaterials Article Stress and Refractive Index Control of SiO2 Thin Films for Suspended Waveguides Neal Wostbrock 1,2 and Tito Busani 2,3,* 1 Department of Nanoscience and Microsystems Engineering, School of Engineering, University of New Mexico, MSC01 1120, Albuquerque, NM 87131-0001, USA; email@example.com All rights reserved. Acrylic was one of the earliest polymers to be commercialized. (M-F). 1205-1208 (1965), I. H. Malitson (1965) "Interspecimen Comparison of the Refractive Index of Fused Silica" JOSA, Vol. Soc. Measure CdTe, CdS, CIGS, amorphous-Si, TCOs, anti-reflection (AR) layers, and more... Copper indium gallium diselenide, CIGS, Cadmium telluride, CdTe, Cad tel,, Amorphous silicon, Amorphous Si, a-Si, Cadmium sulfide, CdS, window layer, buffer layer, Thin-film photovoltaic, Thin-film PV, TFPV, photovoltaics, Solar, Solar cells, Inline, In-situ, Roll-to-roll, R2R, Evaporation, Sputtering, CVD, MOCVD, PECVD, Transparent conductive oxide, TCO, Indium tin oxide, ITO, tin-doped indium oxide. For a typical sample of Amorphous Silicon the refractive index Metallized, Metallization, Foils, Stents, Mirrors, Steel, Stainless Steel, Gold, Nickel, Aluminium, Silver, Cobalt, Zinc, Molybdenum, Titanium, Chrome, Chromium, Niobium, Tungsten, Gallium, Germanium. at 632.8 nm are Determination of refractive index of silica glass for infrared wavelengths by IR spectroscopy, J. Non-Cryst. SU-8, resist, Photoresist, PR, AZ, AZP, ZEP, positive, negative, g-line, i-line, KrF, PMMA, FEP, GRX, KMPR. The tool can be used to map thin-film thickness of samples up to 200 mm in diameter quickly and easily using an advanced spectral reflectance system. Mon-Fri), To request the proprietary encrypted file please enter your Filmetrics® system information, Your serial number could not be found. Filmetrics systems are widely used in the polymer-films community to measure thickness in-line. All rights reserved. You must click "I Accept" on the banner below to submit information. By more precise variable angle monochromatic fringe observation (VAMFO), it has been found possible to improve the precision of thickness determinations of transparent thin films (800 Å to several microns) on reflective substrates to better than 0.1%, and to extend the determination of the refractive index to films as thin as 900 Å. Acrylic, Automotive industry, Chemical resistance, Clear coating, Decorative coating, Hardcoat, Eyewear, Face shield, Hardcoat, Hardness, Interpenetration Layer, Marring, Ophthalmic lens, Optical quality, Plastic lens, Polycarbonate, Polyester, Siloxane, Primer, Protective film, Scratch resistant, Screen protection, Surface finish, Surface protection, Thermal cure, Top coating, Touch screen, UV coating, UV cure. When the fringe order is known, this method is more convenient than that described in the earlier paper. Simply set your parylene-coated sample on the stage of the F3-CS to measure its thickness! Uses include a wide variety of transparent coverings (both protective and decorative), e-beam photoresists and a plethora of medical applications. Measure refractive index and extinction coefficient over wavelengths as wide as 190-1700nm. Selecting this option will search all publications across the Scitation platform, Selecting this option will search all publications for the Publisher/Society in context, The Journal of the Acoustical Society of America, IBM Components Division, Poughkeepsie, New York. Its optical performance can be enhanced by applying scratch-resistant, SiO2-based, thin films. (24 Hr. For a typical sample of Polycrystalline Silicon the refractive index and extinction coefficient at 632.8 nm are 3.92945 and 0.07175439. 3-dimensional surface profile measurements to measure surface roughness. A motorized r-theta stages moves automatically to the selected measurement points and provides fast thickness measurement. The F3-sX is used throughout the chip making industry to measure backside thinning of silicon. (2007) Analysis of the dispersion of optical plastic materials, Optical Materials 29, 1481-1490. Use the F10-AR to measure reflectance and color, as well as AR and hardcoat layer thicknesses. We’ve measured dozens of different resists, and can generate index files for any resist you use. 아래는 굴절률, 흡수율의 파일 입니다. Proprietary encrypted file for use with Filmetrics Systems: © Copyright 2020 KLA Corporation. Our user-controlled solver allows rapid acquisition of the correct result. and extinction coefficient "Request". While acrylic’s refractive index is usually close to the values reported below, this can be adjusted by copolymerization with other monomers. In der Datenbank ist für jedes Material der Brechungsindex als Funktion der Wellenlänge mindestens im Bereich von 400 - 1000nm aufgeführt. Filmetrics systems are used widely in the automotive industry to verify hardcoat and primer thickness. Am. If Red curve is much too wavy or too smooth, then your guess of thickness was not close enough - [Edit Recipe] & … 1 for the 0.21-3.71 μm wavelength range. All rights reserved. Mon-Fri), To request the proprietary encrypted file please enter your Filmetrics® system information, Your serial number could not be found. (24 Hr. Refractive Index (n), if calc'd, should be near the expected value for the film. Conversely, incorporating monomers that contain nitrogen or bromine can increase its index of refraction. © Copyright 2020 KLA Corporation. Filmetrics stocks instruments that measure the thousands of dielectric films used throughout industry. 전형적인 SiO2 샘플의 Here are some of the most common dielectrics: SiO2 – Silicon dioxide is one of the simplest materials to measure, primarily because it is non-absorbing (k=0) over most wavelengths and is usually very close to being stoichiometric (i.e.